Contamination-Free Manufacturing for Semiconductors and Other Precision Products
by: DONOVAN
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Topics include: airborne molecular contaminants, showerhead holes, hydroxide termination, interplate region, first product shipment technology generation, chemical distribution systems, enhanced particle deposition, measured postcritical clean, metallic impurity removal, net deposition velocity, terminated oxide, airborne molecular contamination, plasma extinction, free molecule limit, hydride termination, particle source term, wafer potential, cleanroom air, megasonic energy, planar trap, defect budget, free molecular limit, free molecule regime, piranha baths, particle deposition velocity
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First Sentence:
Contamination-free manufacturing (CFM) means carrying out product manufacturing in environments and with processes that do not cause degradation in product performance or manufacturability attributable to contamination inadvertently introduced by these environments or processes.
Recognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments.
Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)!
Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products:
Details the physics and chemistry behind the mechanisms leading to contamination-induced failures
Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants
Outlines primary contamination problems and target control levels
Reveals and offers solutions to inadequate areas of measurement capability and control technology
Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms
Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.
Table of Contents
National Technology Roadmap for Semiconductors - basis and alignment
off-wafer measurement of contaminants
on-wafer measurement of molecular contaminants
transport and deposition of aerosol particles
particulate deposition in liquid systems
deposition of molecular contaminants in gaseous environments
contamination removal from surfaces
deposition of metallic contaminants from liquids and their removal
sources of contamination and their control.
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